Juan de Pablo, Institute for Molecular Engineering, University of Chicago
October 16, 2014
University of Chicago, Searle 240A, 5735 S. Ellis Ave. This talk will be broadcast via Adobe Connect

Directed copolymer assembly (DCA) has emerged as a promising alternative for patterning at sub-lithographic length scales. The basic idea is to control the self-assembly of multiblock polymers through the application of external fields, surface patterns, and processing conditions. By employing materials whose characteristic dimensions are smaller than those of canonical features encountered in semiconductor devices, it is possible to integrate self-assembling systems into existing manufacturing processes, thereby increasing resolution at modest expense.